仪器简介：
The e-flux Mini E-Beam Evaporator is an UHV evaporator for small and medium quantities of almost any material in the temperature 
range of 400K to 3100K. Evaporation is possible either directly from evaporant in rod form (Ø26mm) 
or out of a crucible. An integrated flux monitor allows maximum deposition control.
 Highly efficient watercooling ensures negligible outgassing during operation. 
The e-flux electron beam evaporator is very compact and mounted on a CF-40 flange (2.75"OD). 
很容易安装在已经有的 UHV 或 MBE系统上。 
主要应用是：表面科学，薄膜沉积，薄膜掺杂 
主要蒸发材料： Mo, Ta, W, Au, Ag, Pt, Al, Cu, Ni, Ti, C, Si, Cr

技术参数：
真空腔体内长度: 190mm (without options). Special length possible on request.
zei大真空端直径: 34mm
安装法兰口径: NW40CF (2.75"OD)
烘烤温度: max. 200°C
rod feed棒材: 25mm, optionally 50mm
坩埚体积: 0,3ccm
坩埚材料: Mo, Ta, W, pyrol. Graphite, BN liner, Al2O3, Quartz
沉积速率: from <0,01A/s to >2nm/s
束流发散角: ±15° (±12° with flux monitor)
电子束功率: max. 600W
控制器: 19" rack mount, 3U high,
230VAC/50Hz

选项:
挡板 (manual and motorised)
flux monitor/flux controller, Deposition Controller*
热电偶
离子阱
各种坩埚 (see above) with end caps for horizontal mount
motorised rod feed
control options (schematic)

主要特点：
独有特点:
1,发射电流稳定性:
The emission current stabilizer is a closed loop control to keep the emission
current constant automatically with rod melting down or decrease of crucible content

2,LED提示棒材位置
An LED alerts when the evaporation rod has to be fed. Threshold can be customer set.

3,可输入需要的发射电流
The emission current can now be set directly on a linear scale for easy reproduction.

4,离子阱选项
The ion trap option allows to deflect all charged particles out of the beam.